Call for Papers
for an OPEN to all and focused thematically special issue of Micro and Nano Engineering Journal
(Gold open access mirror journal of Microelectronic Engineering, Elsevier)
Advanced Micro and Nano Patterning 2019
Short title: NanoPattern 2019
including selected papers from the
45th Micro and Nano Engineering conference MNE2019
This issue is an ‘open call’. This means that, while including selected papers presented at MNE2019, it is also open to other authors. This special issue includes topics mainly related to semiconductor research and industry, and in addition to other research and manufacturing sectors where lithography and pattern transfer are important. Contributions are focused on the lithographic material, lithographic process, metrology, and finally on advanced etching and patterning. Contributions should be mainly concentrated in a single process/method, from the tentative list below:
Manuscript submission deadline: November 18th 2019
Your paper and associated supplementary information should comprise a complete, novel and full description of your work. Manuscripts of the special issue will be submitted and reviewed via the online Elsevier Editorial System (EES). At submission, you are presented with a choice between the MEE and MNE journals. You will then receive a confirmation letter on the choice you have made. You will also have a chance to change your choice at revision. To be part of MNE2019 special issues you need to choose MNE journal. Articles will then be processed and published with the standard Elsevier publishing timeline for each individual manuscript following acceptance. Accepted papers will be freely available on ScienceDirect as OPEN ACCESS papers WITHOUT any article processing charges. This is a SPECIAL agreement between MNE2019 conference and MNE journal.
If you choose MEE instead of MNE journal at submission, your manuscript will be treated as a regular paper and will no longer be part of MNE special Issues, although it will still be handled by the same guest editors with the same procedure. Accepted papers in MEE will be published under subscription model only.
Instructions for authors
Please note that the special issue papers undergo the same high-standard review process as any other MEE or MNE paper. At least two reviews need to be in agreement per paper before decision, and the typical rejection rate is 50-60%. Therefore, please make sure that both the technical content of your paper and your presentation style and language are of high quality, and that the content is novel, unpublished, and not being considered for publication elsewhere. Do NOT submit work that is not complete yet, or has partially been published before, even if that work is presented in the conference. Please also note that on-line software is used to check plagiarism and doublicate publications. Please check the author guidelines.